Sputtering Target
스퍼터링 타겟은 멀티 아크 이온 또는 마그네트론 스퍼터링 PVD 진공 코팅 산업에서 장식 PVD 코팅 또는 기능성 코팅에 널리 사용되며, 고객의 요구 사항에 따라 다양한 순도를 제공 할 수 있습니다.
681개의 결과 중 1–12 표시
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Alumina Sputtering Target Purity : 99.99%, Thickness : 2.0 mm
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Alumina Sputtering Target Purity : 99.5%, Thickness : 3.15 mm
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Alumina Sputtering Target Purity : 99.99%, Thickness : 3.15 mm
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Alumina Sputtering Target Purity : 99.5%, Thickness : 5.0 mm
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Alumina Sputtering Target Purity : 99.5%, Thickness : 6.35 mm
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Alumina Sputtering Target Purity : 99.99%, Thickness : 6.35 mm
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Aluminum Sputtering target / Disc 0.25mmT Purity : 99.999%, 0.25 mm (thickness)
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Aluminum Sputtering target / Disc 0.5mmT Purity : 99.999%, 0.5 mm (thickness)
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Aluminum Sputtering target / Disc 1.0mmT Purity : 99.999%, 1.0 mm (thickness)
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Aluminum Sputtering target / Disc 2.0mmT Purity : 99.999%, 2.0 mm (thickness)
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Aluminum Sputtering target / Disc 5.0mmT Purity : 99.999%, 5.0 mm (thickness)
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Aluminum Sputtering Target High Purity : 99.999%, Thickness : 2.0 mm