1–12/20개 결과 표시
Lutetium Oxide (Lu2O3) Sputtering Targets
Purity : 99.99%, Formula : Lu2O3 |
|
|
Magnesium Sputtering Target
Thickness : 3.0 mm, Purity : 99.9% |
|
|
Magnesium Sputtering Target
Thickness : 6.0 mm, Purity : 99.9% |
|
|
Magnesium Sputtering Target
Thickness : 12.0 mm, Purity : 99.9% |
|
|
Magnesium Sputtering Target 99.8%
Ø 25. mmD x 3. mmL |
|
|
Magnesium Sputtering Target 99.8%
Ø 25. mmD x 6. mmL |
|
|
Magnesium Sputtering Target 99.8%
Ø 50. mmD x 3. mmL |
|
|
Magnesium Sputtering Target 99.8%
Ø 50. mmD x 6. mmL |
|
|
Magnesium Sputtering Target 99.8%
Ø 76. mmD x 3. mmL |
|
|
Magnesium Sputtering Target 99.8%
Ø 76. mmD x 6. mmL |
|
|
Magnesium Sputtering Target 99.8%
Ø 101. mmD x 3. mmL |
|
|
Magnesium Sputtering Target 99.8%
Ø 101. mmD x 6. mmL |
|
|