685–696/1175개 결과 표시
|
|
|
|
|
Nickel Niobium Titanium (Ni/Nb/Ti) Alloy Sputtering Targets
Purity : 99.95%, Formula : Ni/Nb/Ti |
|
|
|
Nickel Oxide Sputtering Target
Thickness : 3 mm, Condition : Hot - pressed |
|
|
|
Nickel Silicide (NiSi2) Sputtering Target
Purity : 99.5% |
|
|
|
Nickel Silicide (NiSi2) Sputtering Targets
Purity : 99.5%, Formula : NiSi2 |
|
|
|
Nickel Sputtering Target
Thickness : 3.2 mm, High Purity : 99.99 % |
|
|
|
Nickel Sputtering Target
Thickness : 5 mm, High Purity : 99.99 % |
|
|
|
Nickel Sputtering Target
Thickness : 6.35 mm, High Purity : 99.99 % |
|
|
|
Nickel Sputtering Target 99.9%
Ø 25.4 mm x 3.2 mm |
|
|
|
Nickel Sputtering Target 99.9%
Ø 25.4 mm x 6.3 mm |
|
|
|
Nickel Sputtering Target 99.9%
Ø 50.8 mm x 3.2 mm |
|
|
|
Nickel Sputtering Target 99.9%
Ø 50.8 mm x 6.3 mm |
|
|